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getLight-DHc - Compact Deuterium and Halogen Light Source

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The getLight-DHc is a deuterium-halogen light source combining the continuous spectrum of an RF-excited deuterium UV light source and a tungsten halogen VIS-NIR light source in a single optical path., to be used for UV/VIS/NIR- applications. The output energy of the getLight-DHc is relatively low. The use is therefore recommended in transmission setup with large diameter fibers.
The light source emits light from 200-1700 nm and has an SMA connector to easily couple into our fiber optic probe range. The getLight-DHc has an integrated TTL shutter as well as a switch to turn on or off all functions. The shutter can be controlled by another device, e.g. a spectrometer. So it is possible to realize automatically dark measurements. Therefore a SUB-D-15 connector is additionally available.

Technical Details

Deuterium Light SourceHalogen Light Source
Wavelength Range 200 – 400 nm 400 - 1700 nm
Stability < 1mAU < 1mAU
Warm-up time 8 min 1 min
Optical Power in 600 µm fiber 0.2 µWatt 7 µWatt
Lamp Lifetime 1000 hours 2000 hours
Temp. Range 5°C - 35°C
Power Supply 12VDC / 600mA
Dimensions / Weight 175 x 110 x 44 mm

Spectral output of getLight-DHc:

Typical applications for our getLight-DHc are transmission measurements in the UV/VIS spectral range and reflectance applications like thin film measurements. Please note, that you have to analyse in these measurements the specular reflection of a mirror.
The Thin Film measurement system is based on white light interference measurement to determine optical thickness. This white light interference pattern is translated through mathematical functions into optical thickness calculation. For single layer systems the physical thickness can then be calculated when the n and k values of the materials are known. The getSoft-Thin Film software has an extensive built-in database of n and k values for most common used materials and coatings. You can measure layers of 10 nm - 50µm, with a resolution of 1 nm. Thin Film measurement is frequently used in the wafer industry, where plasma etching and deposition processes need to be monitored. Other applications are in fields where optical transparent coatings on metals and glass substrates need to be measured.

Last change 08/16/2007
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